Copper nitride thin films prepared by radio‐frequency reactive sputtering
نویسندگان
چکیده
منابع مشابه
Electrical resistivity of copper oxide thin films prepared by reactive magnetron sputtering
Purpose: Investigation the effect of varying r.f. power and oxygen flow rates during deposition on the electrical properties of copper oxide thin films prepared by reactive magnetron sputtering Design/methodology/approach: The films were characterised by AFM, XPS, four point electrical resistivity probe measurements and spectrophotometry. Findings: The electrical sheet resistance of the films w...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 1995
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.359868